Gas-Shielded Tungsten Arc Welding (GTAW) was modified to a Flux-Cored-Double-Wire GTAW (FCDW-GTAW); in this technique, wires of different compositions are used simultaneously to obtain different microstructures. In the modified GTAW, automatic flux-cored double-wire was used with a combination of four different wires deposited in AISI1020 steel, allowing different microstructures. Pin-on-disk wear tests described by ASTM G99 was used to evaluate the wear coefficients of four hardfacing materials combining Fe–Cr–C, Fe-Cr-C-Nb, Fe-Cr-C-Mo-Nb, and Fe-Cr-C-Mo-Ti alloys. The combination of these wires resulted in a hypoeutectic microstructure with niobium and titanium carbides, with an average hardness of 650 HV0.3, and hypereutectic microstructures formed by different niobium contents, with a microhardness range from 820 to 1020 HV0.3. The wear tests were performed without lubrication at room temperature, using a 6.0 mm diameter polished alumina sphere as a counter-body. The total distance covered was 1000 m with a speed of 0.1 m/s, a track radius of 6.0 cm, and an applied load of 10 N. Hardness, microstructure, wear coefficient, and wear mechanisms were compared. The results showed that wear resistance could be differentiated by the predominant wear mechanism: polishing for the hypoeutectic hardfacing and cracking for the hypereutectic ones.

Abstract Niobium doped dititanium trioxide (Ti2O3:Nb) films were deposited on glass substrates, through grid-assisted magnetron sputtering. The Ti2O3:Nb films were characterized by X-ray diffraction (XRD), electrical conductivity and optical properties. Film deposition was carried out in two different substrate bias modes: DC and unipolar pulsed. Results show that the negative-pulsed mode improves conductivity and crystallinity. The XRD results show peaks corresponding crystallographic planes of Ti2O3. No niobium oxide NbxOy peaks were observed, which indicates that niobium oxide if formed, is amorphous, and/or substituted Nb atoms remain in a solid solution within the Ti2O3 structure. It was observed that "as-deposited" Ti2O3:Nb films (without post annealing) are transparent and electrical conductive, with transmittance that reaches 60% in the visible light wavelength despite the considerable thickness of the film and a miminum resistivity of 2x10-2 Ω.cm which indicates that there is potential for application as Transparent Conductive Oxide (TCO).

This paper reports the effect of pulsed bias in comparison with DC bias on reactive deposition of Ti6Al4V-N films, obtained by Grid Assisted Magnetron Sputtering. The results obtained by X-Ray diffraction (XRD), Energy Dispersive X-ray Fluorescence Spectrometer (EDX) and Atomic Force Microscopy (AFM) show that bias condition affects the crystalline texture and change the roughness and morphology of the films. The DC bias favors the film crystallinity, however the pulsed bias produces smoother films.