The surface of polished porcelain stoneware tile surface was investigated through Atomic Force Microscopy (AFM). Emphasis was given to the investigation of the roughness and gloss parameters which are related with the polishing process evolution of the porcelain stoneware tile surface. The surface roughness is a characteris-tic that intervenes in different interest properties of the product, sometimes negative, being interesting the application of the polymeric resins that tends to level the surface irregularities. In this way, due to possibility of three-dimensional images attainment in AFM, topographical measures was made for the attainment to the main parameters that intervenes in finishing of porcelain stoneware tile surface, on form to contribute for a better agreement of the polishing process in the aesthetic product characteristics. The results achieved disclose that the roughness reduction occurred more visibly in the polishing stages with larger grains, going from 0.650 µm to 0.192 µm between the stages of grit 80 and 1000 in the scanning area of 80 x 80 µm², while the abrasives consisted of smaller grains intervene poorly in superficial roughness, being the main responsible for the samples final gloss, whose value increase from 29.3 to 42.2 GU (gloss units) between the stages of grit 800 and 1500. The surface covering with the polymeric resin reduced significantly the product gloss, without it causes brusque alterations in superficial roughness.
porcelain stoneware tile; polishing; AFM; roughness; gloss
