Acessibilidade / Reportar erro

CVD Diamond growth in the silicon substrates of large area

Diamond films were grown through Chemical Vapor Deposition (CVD) in silicon substrates (100) of large area (80 cm²), in a hot filament chemical vapor deposition (HFCVD), with growth rates over 1,5 µm/h. The growth of samples was made with different gaseous fluxes and different methane percentages (CH4) in hydrogen (H2). The samples were analyzed through optical microscopy, Scanning Electron Microscopy and Raman spectroscopy scattering. Such analyzes showed the presence of a high purity diamond in all samples.

CVD diamond; growth; large area


Escola de Minas Rua Carlos Walter Marinho Campos, 57 - Vila Itacolomy, 35400-000 Ouro Preto MG - Brazil, Tel: (55 31) 3551-4730/3559-7408 - Ouro Preto - MG - Brazil
E-mail: editor@rem.com.br