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Química Nova

Print version ISSN 0100-4042On-line version ISSN 1678-7064

Abstract

ALVES, Oswaldo Luiz; RONCONI, Célia Machado  and  GALEMBECK, André. Metallo-organic decomposition: a chemical approach to thin film deposition. Quím. Nova [online]. 2002, vol.25, n.1, pp.69-77. ISSN 0100-4042.  http://dx.doi.org/10.1590/S0100-40422002000100013.

This review focus the more relevant foundations and applications of the Metallo-Organic Decomposition (MOD) technique, mainly within the last decade. The technique has grown significantly, mainly due to the good results concerning the preparation of multicomponent oxide systems with composition, structural and morphologic control, in a relatively simple way. This opened new opportunities to obtain materials with well-defined electrical and optical properties.

Keywords : thin films; metallo-organic decomposition; MOD.

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