The extrinsic degradation of organic light emitting diodes (OLEDs) remains a critical issue especially concerning degradation due to exposure to light. Very few studies exist and little is known about the related photodegradation products and mechanisms, responsible for quenching of luminescence. In order to gain insight into the degradation mechanisms caused by light exposure of Alq3 thin films, used successfully as electron transport layer and emissive material in the fabrication of OLEDs, we have monitored UV photodegradation through synchrotron radiation-based photoabsorption and photoemission techniques at the carbon, nitrogen, and oxygen 1s edges as well as at the aluminum 2s and 2p edges. The influence of light exposure was simulated using three different wavelengths, namely 254, 365 and 307 nm, the first two nearly corresponding to absorption maxima in the UV spectrum of Alq3. After exposure all spectra show decrease of the photoabsorption and photoemission signals. However, while irradiation at 307 nm causes lesser changes in the total electron yield NEXAFS spectra, strong spectral modifications are observed for 254 and 365 nm exposures. Core level photoemission measurements from non-irradiated and irradiated Alq3 thin films at 307 nm were also performed. While the Al peaks maintained almost intact, changes in peak intensities as well as shifts for carbon, nitrogen and oxygen are much more dramatic.
OLED degradation; tris(8-hydroxyquinoline) aluminum; UV irradiation; photoabsorption; photoemission
