Poly(furfuryl alcohol) with different amounts of oxymethylenic bridges was synthesized using trifluoroacetic and p-toluenesulfonic acid. All polymers displayed a tendency to retain acids. The isolated products containing traces of acid became insoluble in a few hours; while neutral material maintains their solubility for at least one month. Polymers stored in solution were stable according to their ¹H NMR spectra. Polymers cross-linked after being exposed to UV radiation. The product of the reaction of polymer with maleic anhydride is useful for preparing negative photoresists.
Furfuryl alcohol; polymerization; cross-link; photoresist
