Effect of solvents on the morphology of PMMA films fabricated by spin-coating

Padilha, Giovana da Silva; Giacon, Virginia Mansanares; Bartoli, Julio Roberto

doi:10.1590/0104-1428.12516

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Original Article • Polímeros 27 (03) • Jul-Sep 2017 • https://doi.org/10.1590/0104-1428.12516 copy

Effect of solvents on the morphology of PMMA films fabricated by spin-coating

Authorship SCIMAGO INSTITUTIONS RANKINGS

Abstract

A method to produce thin layer of PMMA (poly (methyl methacrylate) films by spin coating is reported. PMMA is dissolved in xylene, a mixture of MIBK-xylene and chloroform. Varying the PMMA concentration and spin-coating speeds controls the thickness of the PMMA films. Using chloroform as solvent evidenced thickness around 10 μm. This thickness is suitable for core of optical polymeric films. These PMMA films with lower roughness are treated with CHF₃ plasma to produce the cladding. The morphology of PMMA films is analyzed by atomic force microscopy and scanning electron microscopy. Profilometry, metricon and contact angle analysis are associated with the effective parameters in roughness and their effect before and after plasma treatment. Gel permeation chromatography (GPC) is used for estimating molecular weights of PMMA.

Keywords:
PMMA; spin-coating; solvent effect; morphology; CHF₃ plasma

Test set	Level botton (-1)	Central point (0)	Level up (+1)
Concentracion (g/L)	10	15	20
Speed (rpm)	1,000	1,500	2,000

	${\bar{M}}_{n}$ (g/mol)	$\bar{Μ}$ _p (g/mol)	${\bar{M}}_{w}$ (g/mol)	${\bar{M}}_{w}$ / ${\bar{M}}_{n}$
PMMA	73.143	120.045	115.116	1.57

PMMA concentration (g/L)	Spin-Coating speed (rpm)	Thin films (μm)
PMMA concentration (g/L)	Spin-Coating speed (rpm)	Xylene	MIBK- xylene	Chloroform
10	1,000	1.99 ± 0.3	1.69 ± 0.2	6.02 ± 0.1
20	1,000	7.70 ± 0.5	7.57 ± 0.1	23.17 ± 0.3
10	2,000	1.48 ± 0.2	1.45 ± 0.2	4.48 ± 0.2
20	2,000	4.86 ± 0.3	5.21 ± 0.3	16.48 ± 0.3
15	1,500	1.77 ± 0.8	4.42 ± 0.2	10.58 ± 0.6
15	1,500	2.56 ± 0.3	4.16 ± 0.5	11.56 ± 0.5
15	1,500	2.04 ± 0.5	5.55 ± 0.1	12.41 ± 0.3

Xylene
Effect	SS	DF	MS	F_calculated	F_critical
Regression	24.82	3	8.27	3.86	9.28
Error	0.32	2	0.16
Total	31.23
MIBK-xylene
Effect	SS	DF	MS	F_calculated	F_critical
Regression	31.85	3	10.62	10.41	9.28
Error	2.34	2	1.17
Total	34.91
Chloroform
Effect	SS	DF	MS	F_calculated	F_critical
Regression	235.99	3	78.66	68.4	9.28
Error	1.68	2	0.84
Total	239.46

*Plasma Process*		*Roughness (Å) After plasma*
Pressure (torr)	Time (min)	*Roughness (Å) After plasma*
0.3	20	2059 ± 125
0.7	20	1423 ± 101
0.5	30	3400 ± 98
0.3	40	3701 ± 113
0.7	40	4402 ± 99

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[1] * giovana.padilha@fca.unicamp.br