SciELO - Scientific Electronic Library Online

vol.56 issue1Simultaneous determination of Pb and Cd in seafood by ICP OES with on-line pre-concentration by solid phase extraction with amberlite XAD-4 after complex formation with DDTPReal time PCR and importance of housekeepings genes for normalization and quantification of mRNA expression in different tissues author indexsubject indexarticles search
Home Pagealphabetic serial listing  

Services on Demand




Related links


Brazilian Archives of Biology and Technology

Print version ISSN 1516-8913


JIN, Wei et al. Improving Aspergillus niger tannase yield by N+ ion beam implantation. Braz. arch. biol. technol. [online]. 2013, vol.56, n.1, pp.135-142. ISSN 1516-8913.

This work aimed to improve tannase yield of Aspergillus niger through N+ ion beam implantation in submerged fermentation. The energy and dose of N+ ion beam implantation were investigated. The results indicated that an excellent mutant was obtained through nine successive implantations under the conditions of 10 keV and 30-40 (×2.6×1013) ions/cm2, and its tannase yield reached 38.5 U/mL, which was about five-time higher than the original strain. The study on the genetic stability of the mutant showed that its promising performance in tannase production could be stable. The studies of metal ions and surfactants affecting tannase yield indicated that manganese ions, stannum ions, xylene and SDS contained in the culture medium had positive effects on tannase production under submerged fermentation. Magnesium ions, in particular, could enhance the tannase yield by the mutant increasing by 42%, i.e. 53.6 U/mL. Accordingly, low-energy ion implantation could be a desirable approach to improve the fungal tannase yield for its commercial application.

Keywords : Aspergillus niger; N+ ion implantation; tannase.

        · text in English     · English ( pdf )


Creative Commons License All the contents of this journal, except where otherwise noted, is licensed under a Creative Commons Attribution License