Abstract

SILVA, Ariel Almeida Abreu  and  ANDRADE-NETO, A.V.. Calculating the field ionization of an atom near a metal surface: application to the field ion microscope. Rev. Bras. Ensino Fís. [online]. 2012, vol.34, n.1, pp. 1-5. ISSN 1806-1117.  http://dx.doi.org/10.1590/S1806-11172012000100004.

In this work we calculate the ionization rate constant (ionization probability per unit of time) as a function of the applied field (we assume a uniform field) and the atom's distance from the metal surface. In order to calculate the probability of barrier penetration we use semiclassical (WKB)approximation. We utilize one-dimensional model potential which is chosen to be a good physical representation of the real system. In addition, the field ion microscope is approached in a elementary way.

Keywords : field ionization; field ion microscopy; WKB approximation.