Acessibilidade / Reportar erro

Structure and bonding of iron-acceptor pairs in silicon

Abstract

Iron-acceptor pairs (Fe-A, A = B, Al, Ga, and In) in silicon were investigated using an ionic-based model, which incorporates the valence electron cloud polarization and the lattice relaxation.Our results are generaly in good agreement with the experimental trends among the Fe-A pairs, describing the increase in the pair donor energy level with increasing A principal quantum number and decreasing pair separation distance, and the pair configurational symmetries.


a49v322a

Structure and Bonding of Iron-Acceptor Pairs in Silicon

S. Zhao,

Texas Instruments Inc., Dallas, TX, 75243

J. F. Justo, L. V. C. Assali,

Instituto de Física, Universidade de São Paulo,

CP 66318, CEP 05315-970, São Paulo, SP, Brazil

and L. C. Kimerling

Massachusetts Institute of Technology, Cambridge, MA, 02139

Received on 23 April, 2001

Iron-acceptor pairs (Fe-A, A = B, Al, Ga, and In) in silicon were investigated using an ionic-based model, which incorporates the valence electron cloud polarization and the lattice relaxation.Our results are generaly in good agreement with the experimental trends among the Fe-A pairs, describing the increase in the pair donor energy level with increasing A principal quantum number and decreasing pair separation distance, and the pair configurational symmetries.

Iron pairs with acceptor impurities in silicon [1], forming electrically active centers. The properties of these pairs, such as the configurational structure and the positions of the energy levels in the band gap, have been investigated by electron paramagnetic resonance (EPR) and deep level transient spectroscopy (DLTS) [2] over the last thirty years. These pairs have been identified as consisting of a substitutional acceptor (As) with an iron (Fei) at either the nearest neighbor (T1, á111ñ symmetry) or the next nearest neighbor (T2, á100ñ symmetry) tetrahedral interstitial site. According to an ionic model, used to explain the experimental data, the FeiAs pairs are formed by a positively charged iron ( or ) and a negatively charged acceptor ().

The ionic model fails in describing several trends among the FeiAs pairs, such as the pair stability and the related positions of the acceptor and donor electronic levels [3]. Adding an elastic energy term to the point charge interaction, Kimerling et al. [4] explained the pair structures observed by the experiments. They noticed that large acceptor impurities provide strong repulsion enough to compete with the Coulomb attraction so that the Fei stays at a T2 site (and not at a T1 site) next to the acceptor. Our model incorporates a new interaction in the point charge Coulomb interaction, a short range attractive component to simulate the valence electronic cloud polarization [5]. The repulsive interaction between Fei and As or Si is approximated by a softened Lennard-Jones type potential, and the silicon crystal is treated as a dielectric medium. The results are compared to the experimental data on configurational symmetries and deep level positions. Our model captured several trends on the pairs observed by experiments [2], showing an increase in the pair donor energy level with increasing principal quantum number of Asand decreasing pair separation distance, opposite to results obtained by Kimerling et al. [4].

When the separation between Fei and Asis comparable to their ionic radii, the electronic cloud of one ion is strongly perturbed by the field of the other, causing an induced polarization on that electronic cloud. Our polarization model (PM) includes a short range attractive component to the Coulomb interaction to describe the electronic cloud polarization. As an estimation to the induced electronic cloud polarization effect, we take the valence electronic cloud as a charged spherical surface at certain radius around the radial peak position of the valence electronic charge density. Then, similar to the interaction between two conducting spheres, the electrostatic interaction can be written as (r º rFe–A)

where a1 and a2 are the valence electronic cloud spherical surface radii, q1 and q2 are the net ionic charges.

The calculations were performed using 279 Si atoms, one As, and one Fei. The distance rFe–A is changed along á111ñ direction (passing through T1 and T4 sites) and á100ñ direction (passing through T2 site) to find the potential curves for , , and . The minimum of each curve Vmin(), Vmin(), and Vmin() is the ground state for , , and , respectively. The model predicts the FeiAspair configurational symmetries by determining the energetically favorable sites for Fei.

Fig. 1 shows the potential curves along á111ñ and á100ñ directions for , and . According to Figs. 1a and 1d, stable FeiBs and metastable FeiIns pairs have á111ñ-trigonal symmetry, while stable FeiIns and metastable FeiBs pairs have á100ñ-orthorhombic symmetry. The á111ñ-trigonal symmetry can be assigned to stable , , , and pairs, while metastable , , , and pairs show á100ñ symmetry (Figs. 1b and 1c). In addition, Figs. 1b and 1c predict that the stable pair exhibits á100ñ symmetry, while the stable pair has equal probability to show either á111ñ-trigonal or á100ñ-orthorhombic structures. The assignments for stable and metastable structures are in good agreement with the EPR and DLTS observations [2]. The stable configuration switches from á111ñ-trigonal to á100ñ-orthorhombic for FeiAs pairs going from Bs to Ins, and is related to an increase in repulsion between As and Fei.


The minimum of each curve can be used to compute the pair acceptor and donor levels. For Fei at near neighbor T sites relative to As, the donor level ()0/+ is given by

where En is the top of the valence band and is the minimum of the potential curve at near neighbor sites of . The pair acceptor level ( )-/0 is obtained by adding the difference Vmin()-Vmin() to the donor level. For isolated Fei, at remote sites relative to As, Vmin()-Vmin()=0.38 eV, which is consistent with experimental data that only one donor level at En+0.38 eV exists in the band gap. In our model, the difference between Vmin() and Vmin() for isolated Fei arises from the elastic energy caused by electron shell overlap between atoms. Fig. 2 shows the donor (0/+) and acceptor (-/0) levels for the transitions as computed by our polarization model for Fei sitting at T1 (Fig. 2a) or T2 (Fig. 2b) sites. Our results for the pair donor and acceptor levels agree very well with the known experimental data for the (0/+) and (-/0) transitions.



The PM predicts the correct magnitudes and trends of the donor level for the T1 site (ET(1)) and the T2 site (ET(2)) pairs with increasing As size and decreasing rFe–A as observed in experiments, while the point charge model would give an opposite trend. According to our model, repulsion and polarization from As should give a maximum contribution at the T1 site and yield the greatest variation in FeiAs pair energy levels. This is consistent with the experimental data that ET(1) displays the greatest sensitivity to As identity and ET(2) shows relative uniformity. The PM suggests that the pair acceptor level ( )-/0 should become shallower in the band gap as As goes from Bs to Ins, while recent experimental data [6] suggest that this level is almost constant for As.

The pair binding energies are shown in Table I. The model predicts a trend of monotonic decrease with increasing As size for both and . The increase in binding energy due to valence electronic cloud polarization competes with the repulsive interaction so that the model gives nearly constant binding energies for both and , consistent with experimental data [3,7,8]. Lattice relaxation clearly plays an important role in determining the pair binding energy.

The relative population of FeiAs pairs in a certain charge state at T1 and T2 sites (R12) is calculated, based on a Boltzmann distribution at thermal equilibrium:

where DE12 = Emin(T2)– Emin(T1) is the energy difference for Fei at the T1 and T2 sites, and Z is the site degeneracy. The relative site populations for the pairs are compared with results from metastability experiments in Table II. Our model provides a good description of the energy differences between the T1 and T2 sites (DE12) for all the pairs. The calculated N(1)/N(2) ratios at T = 200 K, around the temperature of the observed structural transformation [8,9], also agree very well with the experimental data.

In summary, our model captures several effects within the ionic model framework: (i) trends among the FeiAs pairs revealing a deepening of the donor level in the band gap with increasing principal quantum number of Asand decreasing pair separation distance rFe–A; and (ii) configurational symmetries and the bistability of the pairs. However, the deviations at ET(1) between measured and calculated data suggest that other interactions are still missing. The deviations could come from the limitations of the ionic models at near neighbor T sites. The bulk, treated as dielectric medium, can still be valid for the space between a T4 site and the As, and between a T2 site and the As. However, at the T1 site, the screening would hardly be effectively described by the bulk dielectric constant, since one of the Fei first neighbors is the As. Covalency involving the Fei, As, and surrounding Si atoms may also play an important role, as pointed out by first-principles calculations [11,12,13]. Although a complete understanding on the properties of the pairs should be established with more detailed experiments and calculations, our model is important in identifying the contribution of each interaction for the pair formation.

Acknowledgments

This work is supported by the NREL under contract No. XD-2-11004-4. JFJ and LVCA thank the Brazilian agencies FAPESP and CNPq for financial support.

References

[1] G. W. Ludwig and H. H. Woodbury, Solid State Phys. 13, 223 (1962).

[2] A. A. Istratov, H. Hieslmair, and E. R. Weber, Appl. Phys. A 69, 13 (1999).

[3] L. C. Kimerling and J. L. Benton, Physica 116B, 297 (1983).

[4] L. C. Kimerling, M. T. Asom, J. L. Benton, P. J. Drevinsky, and C. E. Caefer, Mater. Sci. Forum 38-41, 141 (1989).

[5] S. Zhao, L. V. C. Assali, J. F. Justo, G. H. Gilmer, and L. C. Kimerling, J. Appl. Phys. 90, 2744 (2001).

[6] P. Tidlund, M. Kleverman, and H. G. Grimmeiss, Semicond. Sci. Technol. 11, 748 (1996).

[7] W. Wijaranakula, J. Electrochem. Soc. 140, 275 (1993).

[8] A. Chantre and D. Bois, Phys. Rev. B 31, 7979 (1985).

[9] A. Chantre and L. C. Kimerling, Mater. Sci. Forum 10-12, 387 (1986).

[10] H. Takahashi, M. Suezawa, and K. Sumino, Mater. Sci. Forum 83-87, 155 (1992).

[11] L. V. C. Assali and J. R. Leite, Mater. Sci. Forum 10-12, 55 (1986); 38-41, 409 (1989); 83-7, 143 (1992).

[12] L. V. C. Assali and J. F. Justo, Phys. Rev. B 58, 3870 (1998).

[13] J. F. Justo and L. V. C. Assali, Int. J. Mod. Phys. B 13, 2387 (1999).

  • [1] G. W. Ludwig and H. H. Woodbury, Solid State Phys. 13, 223 (1962).
  • [2] A. A. Istratov, H. Hieslmair, and E. R. Weber, Appl. Phys. A 69, 13 (1999).
  • [3] L. C. Kimerling and J. L. Benton, Physica 116B, 297 (1983).
  • [4] L. C. Kimerling, M. T. Asom, J. L. Benton, P. J. Drevinsky, and C. E. Caefer, Mater. Sci. Forum 38-41, 141 (1989).
  • [5] S. Zhao, L. V. C. Assali, J. F. Justo, G. H. Gilmer, and L. C. Kimerling, J. Appl. Phys. 90, 2744 (2001).
  • [6] P. Tidlund, M. Kleverman, and H. G. Grimmeiss, Semicond. Sci. Technol. 11, 748 (1996).
  • [7] W. Wijaranakula, J. Electrochem. Soc. 140, 275 (1993).
  • [8] A. Chantre and D. Bois, Phys. Rev. B 31, 7979 (1985).
  • [9] A. Chantre and L. C. Kimerling, Mater. Sci. Forum 10-12, 387 (1986).
  • [10] H. Takahashi, M. Suezawa, and K. Sumino, Mater. Sci. Forum 83-87, 155 (1992).
  • [11] L. V. C. Assali and J. R. Leite, Mater. Sci. Forum 10-12, 55 (1986);
  • [12] L. V. C. Assali and J. F. Justo, Phys. Rev. B 58, 3870 (1998).
  • [13] J. F. Justo and L. V. C. Assali, Int. J. Mod. Phys. B 13, 2387 (1999).

Publication Dates

  • Publication in this collection
    26 Nov 2002
  • Date of issue
    June 2002

History

  • Received
    23 Apr 2001
Sociedade Brasileira de Física Caixa Postal 66328, 05315-970 São Paulo SP - Brazil, Tel.: +55 11 3091-6922, Fax: (55 11) 3816-2063 - São Paulo - SP - Brazil
E-mail: sbfisica@sbfisica.org.br