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Characterization of fabrication process of micropores on silicon substrate by electrochemical method

ABSTRACT

In the present work, the fabrication process of a set of micropores on crystalline silicon wafers manufactured through wet etching technique was studied. The influence of different control factors such as voltage, temperature and braking agent on the specific characteristics of formation was evaluated. An exhaustive analysis of the evolution of electric currents during the fabrication made possible to standardize the process and determine the pore-formation time, essential feature considering the exigent requirements of industry. Finally, it was concluded that optimum conditions for a controlled fabrication of pores correspond to a temperature of 84 ˚C, HCl as a braking agent and voltages of 0,1V, 0,5V and 1V respectively. The above results are of great importance in different fields, such as biology or medicine, in relation to the utility of pores as sensing devices.

Keywords
macropores; biological sensors; wet etching; silicon

Laboratório de Hidrogênio, Coppe - Universidade Federal do Rio de Janeiro, em cooperação com a Associação Brasileira do Hidrogênio, ABH2 Av. Moniz Aragão, 207, 21941-594, Rio de Janeiro, RJ, Brasil, Tel: +55 (21) 3938-8791 - Rio de Janeiro - RJ - Brazil
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